✦ LIBER ✦

Ion beam synthesis of buried metallic and semiconducting silicides

✍ Scribed by S. Mantl

Book ID: 113283513
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 339 KB
Volume: 80-81
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(93)90704-a

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Ion beam synthesis of buried and surface

Ion beam synthesis of buried and surface nickel silicides during a single implantation step

✍ M.F. Wu; J. De Wachter; H. Pattyn; H. Pattyn; A.-M. Van Bavel; G. Langouche; J. 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 975 KB

Precipitation kinetics in silicon during

Precipitation kinetics in silicon during ion beam synthesis of buried silicide layers

✍ H. Trinkaus; S. Mantl 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 417 KB

Foreign atom incorporation during metal

Foreign atom incorporation during metal silicide formation by ion beam synthesis

✍ Yanwen Zhang; Harry J. Whitlow; Tonghe Zhang 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 201 KB

Ion beam synthesis of buried CrSi2 layer

Ion beam synthesis of buried CrSi2 layers

✍ Chr. Dudda; S. Mantl; Ch. Dieker; M. Dolle; H. Lüth 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 274 KB

Ion beam synthesis of buried CoSi2-struc

Ion beam synthesis of buried CoSi2-structures

✍ T. Vogel; J. Meijer; A. Stephan; U. Weidenmüller; Ü. Dagkaldiran; S. Kubsky; P. 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 331 KB

Ion beam synthesis of buried epitaxial F

Ion beam synthesis of buried epitaxial FeSi2

✍ K. Radermacher; S. Mantl; R. Apetz; Ch. Dieker; H. Lüth 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 333 KB

We fabricated continuous buried layers of the metallic a-FeSi 2 phase by high dose implantation of Fe + into ( 11 I ) silicon wafers and subsequent rapid thermal annealing at 1150 °C for 10 s. As determined from Rutherford backscattering spectrometry, these a-FeSi 2 layers have a stoichiometry of Fe