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Ion beam etching InP at elevated temperatures

✍ Scribed by AP Webb; RS Sussmann


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
698 KB
Volume
36
Category
Article
ISSN
0042-207X

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As a 2-dimensional photonic crystal, columns periodically arranged with nanometer order pitches have been formed on GalnAsP/InP wafer, aiming at the effective control of spontaneous emission without discrimination of nonradiative process. For the fine and low damage etching of columns, a reactive io