𝔖 Bobbio Scriptorium

✦ LIBER ✦

Investigations on the damage caused by ion etching of SiO2 layers at low energy and high dose

✍ Scribed by Hans R. Deppe; Barbara Hasler; Joachim Höpfner

Publisher: Elsevier Science
Year: 1977
Tongue: English
Weight: 388 KB
Volume: 20
Category: Article
ISSN: 0038-1101
DOI: 10.1016/0038-1101(77)90033-8

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Investigations on the damage caused by i

Investigations on the damage caused by ion etching of SiO2 layers at low energy and high dose : Hans R. Deppe, Barbara Hasler and Joachim Hopfner. Solid-St. Electron.20, (1) 51 (1977)

📂 Article 📅 1977 🏛 Elsevier Science 🌐 English ⚖ 129 KB

On the mechanism of sputtering of SiO2 b

On the mechanism of sputtering of SiO2 by Ar at ion energies near the sputtering threshold : S. S. Todorov and I. R. Chakarov. Vacuum39(11/12), 1101 (1989)

📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 132 KB