Investigations on the damage caused by ion etching of SiO2 layers at low energy and high dose : Hans R. Deppe, Barbara Hasler and Joachim Hopfner. Solid-St. Electron.20, (1) 51 (1977)

• Publisher: Elsevier Science
• Year: 1977
• Tongue: English
• Weight: 129 KB
• Volume: 16
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(77)90404-8