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Investigation of the microstructure of IrSiX thin films

✍ Scribed by R. Kurt; W. Pitschke; J. Thomas; H. Wendrock; W. Brückner; K. Wetzig

Publisher
Springer
Year
1998
Tongue
English
Weight
603 KB
Volume
361
Category
Article
ISSN
1618-2650

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In this article we present microstructural investigations of electrodeposited CuAg-alloy metallization thin films. The deposition was carried out on Si(100) / SiO / Ta / TaN / Cu-seed substrates at room temperature without any additives. It was 2 found that the mean grain size decreases with increas