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Investigation of the effect of oxygen gas on properties of GAZO thin films fabricated by facing targets sputtering system

✍ Scribed by Hong, Jeong Soo; Matsushita, Nobuhiro; Kim, Kyung Hwan

Book ID
127117846
Publisher
Institute of Physics
Year
2014
Tongue
English
Weight
1013 KB
Volume
29
Category
Article
ISSN
0268-1242

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The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a