Investigation of interfacial reactions in thin film couples of aluminum and copper by measurement of low temperature contact resistance

✍ Scribed by J.A. Rayne; M.P. Shearer; C.L. Bauer

• Publisher: Elsevier Science
• Year: 1980
• Tongue: English
• Weight: 645 KB
• Volume: 65
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(80)90248-5