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Investigation of HfO2 high-k dielectrics electronic structure on SiO2/Si substrate by x-ray photoelectron spectroscopy

โœ Scribed by Duan, T. L.; Yu, H. Y.; Wu, L.; Wang, Z. R.; Foo, Y. L.; Pan, J. S.


Book ID
121274246
Publisher
American Institute of Physics
Year
2011
Tongue
English
Weight
929 KB
Volume
99
Category
Article
ISSN
0003-6951

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