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A study of the structure of (HfO2)x(Al2O3)1−x/Si films by X-ray photoelectron spectroscopy

✍ Scribed by V. V. Kaichev; Yu. V. Dubinin; T. P. Smirnova; M. S. Lebedev

Book ID: 110170569
Publisher: SP MAIK Nauka/Interperiodica
Year: 2011
Tongue: English
Weight: 170 KB
Volume: 52
Category: Article
ISSN: 0022-4766
DOI: 10.1134/s002247661103005x

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