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Investigation of dual ion beam sputtered transparent conductive Ga-doped ZnO films

✍ Scribed by Pandey, Saurabh Kumar; Pandey, Sushil Kumar; Verma, Shruti; Gupta, M.; Sathe, V.; Mukherjee, Shaibal


Book ID
121601715
Publisher
Springer US
Year
2013
Tongue
English
Weight
689 KB
Volume
24
Category
Article
ISSN
0957-4522

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## Abstract Sputtering deposition of Ga‐doped ZnO (ZnO:Ga) thin films was carried out using the helicon‐wave‐excited plasma sputtering (HWPS) method. The films sputtered above 150 Β°C had a preferential {0001} orientation. According to the surface‐damage‐free nature, the films having featureless sur