Different processes involving an inductively coupled plasma reactor are presented either for deep reactive ion etching or for isotropic etching of silicon. On one hand, high aspect ratio microstructures with aspect ratio up to 107 were obtained on sub-micron trenches. Application to photonic MEMS is
β¦ LIBER β¦
Investigation of Cell Culturing on High-Aspect-Ratio, Three-Dimensional Silicon Microstructures
β Scribed by Merlo, S.; Barillaro, G.; Carpignano, F.; Surdo, S.; Strambini, L.; Montecucco, A.; Leva, V.; Mazzini, G.
- Book ID
- 117884991
- Publisher
- IEEE
- Year
- 2012
- Tongue
- English
- Weight
- 595 KB
- Volume
- 18
- Category
- Article
- ISSN
- 1077-260X
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