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Investigation of a graded channel InGaAs/GaAs heterostructure transistor

✍ Scribed by Yih-Juan Li; Jan-Shing Su; Yu-Shyan Lin; Wei-Chou Hsu


Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
154 KB
Volume
28
Category
Article
ISSN
0749-6036

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✦ Synopsis


An InGaAS/GaAs heterostructure transistor utilizing a graded In x Ga 1-x As channel grown by low-pressure metal-olorganic chemical vapor deposition has been demonstrated. A negative differential resistance (NDR) phenomenon is observed. Electron mobilities are significantly improved by using the graded InGaAs channel. For the In composition varying from x = 0.25 (at the buffer-channel interface) to x = 0.1 (at the spacer-channel interface) structure, a peak extrinsic transconductance of 24.6 S mm -1 (at V DS = 6.5 V, V GS step = -0.5 mV) and a saturation current density as high as 555 mA mm -1 for a gate length of 1.5 Β΅m are obtained.


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