Intersubband absorption in modulation doped p-type Si1-xGex quantum wells: theory and experiment
✍ Scribed by T. Fromherz; E. Koppensteiner; M. Helm; G. Bauer; J.F. Nützel; G. Abstreiter
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 226 KB
- Volume
- 15
- Category
- Article
- ISSN
- 0749-6036
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✦ Synopsis
A study of intersubband infrared absorption in modulation doped p-type (\mathrm{Si} / \mathrm{SiGe}) quantum wells is presented for SiGe wells with thicknesses between (22 \AA) and (64 \AA) and (\mathrm{Ge}) contents in the range from (23 %) to (58 %). The peak positions of the absorption lines are observed between (500 \mathrm{~cm}^{-1}) and (2200 \mathrm{~cm}^{-1}). Depending on the barrier height (i.e., on the Ge content of the wells), the heavy-hole states excited by the infrared radiation are either localized in the wells or strongly mixed with barrier-bound states and therefore delocalized. The shape of the absorption line correspondingly changes from a narrow Lorentz line to a rather broad absorption band. Using the structural parameters determined by high-resolution triple-axis x-ray diffraction, the results of a self-consistent LuttingerKohn type envelope function approach with the explicit inclusion of the strain in the quantum wells are in excellent agreement with the measured spectra.
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A detailed study of the polarization dependence of subband absorption and photoconductivity in pseudomorphic p-type Si/Si 0.64 Ge 0.36 quantum wells is presented. The fabricated quantum well infrared photodetectors (QWIP) show a photoresponse between 3 and 8 µm with a peak-wavelength of λ p = 5 µm u
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