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Interfacial reactions between Al and RuO2, MoOx and WNx diffusion barriers on Si

✍ Scribed by S. E. Hörnström; A. Charai; O. Thomas; L. Krusin-Elbaum; P. M. Fryer; J. M. E. Harper; S. Gong; A. Robertsson

No coin nor oath required. For personal study only.

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