SiO2and Si nanoscale patterning with an
β
B. Klehn; U. Kunze
π
Article
π
1998
π
Elsevier Science
π
English
β 295 KB
The use of an atomic force microscope (AFM) as a nanolithographic tool is demonstrated. A photoresist layer several nanometre thin is indented by the vibrating AFM tip, where software control switches the tapping force from the imaging to the patterning mode. The resist pattern is transferred into a