Effect of weak metallic contamination on
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D. Mello; C. Coccorese; E. Ferlito; G. Sciuto; R. Ricciari; P. Barbarino; M. Ast
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Article
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2011
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John Wiley and Sons
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English
⚖ 258 KB
## Abstract The detection of metallic contaminants in microelectronics devices is one of the main issues in production line. In fact they could diffuse rapidly into the silicon bulk and establishing energy states into the silicon energy‐band gap. The presence of trace of metals on the silicon surfa