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InP surface properties under ICP plasma etching using mixtures of chlorides and hydrides

✍ Scribed by B. Liu; J.-P. Landesman; J.-L. Leclercq; A. Rhallabi; C. Cardinaud; S. Guilet; F. Pommereau; M. Avella; M.A. González; J. Jiménez


Book ID
104064259
Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
167 KB
Volume
9
Category
Article
ISSN
1369-8001

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