Modeling of InP Etching Under ICP Cl 2 /Ar/N 2 Plasma Mixture: Effect of N 2 on the Etch Anisotropy Evolution

✍ Scribed by Chanson, Romain; Rhallabi, Ahmed; Fernandez, Marie Claude; Cardinaud, Christophe

• Book ID: 120461109
• Publisher: John Wiley and Sons
• Year: 2012
• Tongue: English
• Weight: 674 KB
• Volume: 10
• Category: Article
• ISSN: 1612-8850
• DOI: 10.1002/ppap.201200083