Boron thin films were prepared by plasma assisted chemical vapor deposition. The source gas was boron trichloride (BCl 3 ). Ring patterns of transmission electron beam diffraction indicated that films were polycrystalline -rhombohedral boron. Optical absorption edge was estimated from absorption spe
β¦ LIBER β¦
Initial studies of the preparation and properties of vanadium thin films
β Scribed by J.D. Blades; J. Gerber; C.T. Thompson
- Publisher
- Elsevier Science
- Year
- 1960
- Tongue
- English
- Weight
- 249 KB
- Volume
- 1
- Category
- Article
- ISSN
- 0038-1101
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Boron thin 5lms were deposited by electron beam evaporation and by pyrolysis of decaborane on quartz substrates. Re6ection electron beam di4raction was used to characterize the crystal structure. The amorphous structure was observed for the 5lm deposited by electron beam evaporation. The 5lm was pol