Infrared studies of silicon nitride
โ Scribed by E. Ermer; W.S. Ptak
- Publisher
- Elsevier Science
- Year
- 1986
- Tongue
- English
- Weight
- 197 KB
- Volume
- 143
- Category
- Article
- ISSN
- 0022-2860
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๐ SIMILAR VOLUMES
We discuss the usefulness of the two-prism coupling geometry to perform non-destructive multiple internal reflection (MIR) measurements on 200 mm silicon wafers. Application to the determination of the SiยฑH and NยฑH bond concentrations in LPCVD SiN ultra-thin films, is presented. It is shown that an
Transmission electron microscopy has been used to isolate and examine the intergranular glass phase in hot-pressed silicon nitride/silicon carbide composites. Previously there have been difficulties in locating a suitable region for studies of this nature because the interfering nitride and carbide