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Infrared and raman studies of chemically vapor deposited amorphous silica

✍ Scribed by Maria Huffman; Paul McMillan

Book ID: 118332984
Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 489 KB
Volume: 76
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(85)90011-0

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