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Influence of thermal treatments on the distribution of contaminating copper near the surface of silicon: a comparative SIMS and XPS study

✍ Scribed by D. Ballutaud; P. de Mierry; M. Aucouturier; E. Darque-Ceretti

Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
611 KB
Volume
47
Category
Article
ISSN
0169-4332

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