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Influence of temperature on the crystal habit of silicon in the SiHCl CVD system I. Experimental results

✍ Scribed by J.G.E. Gardeniers; W.E.J.R. Maas; R.Z.C. Van Meerten; L.J. Giling


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
898 KB
Volume
96
Category
Article
ISSN
0022-0248

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## Abstract In the present work are presented the results of the thermodynamic analysis of the interaction processes in the system Si‐C‐H‐Cl in the temperature interval 1000‐3000 K. The equilibrium pressures of the components in the system Si‐C‐H‐Cl with taking account the formation of the condense