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Influence of silicon wafer surface orientation on very thin oxide quality

✍ Scribed by Ohmi, T.; Matsumoto, K.; Nakamura, K.; Makihara, K.; Takano, J.; Yamamoto, K.


Book ID
121495823
Publisher
American Institute of Physics
Year
1995
Tongue
English
Weight
796 KB
Volume
77
Category
Article
ISSN
0021-8979

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