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Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas

✍ Scribed by Cunge, G; Kogelschatz, M; Sadeghi, N

Book ID: 126958085
Publisher: Institute of Physics
Year: 2004
Tongue: English
Weight: 392 KB
Volume: 13
Category: Article
ISSN: 0963-0252
DOI: 10.1088/0963-0252/13/3/019

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