Influence of the silicon surface treatment by plasma etching and scratching on the nucleation of diamond grown in HFCVD - a comparative study

✍ Scribed by Shafeeque G. Ansari; Mushtaq Ahmad Dar; Young-Soon Kim; Hyung-Kee Seo; Gil-Sung Kim; Rizwan Wahab; Zubaida A. Ansari; Jae-Myung Seo; Hyung-Shik Shin

• Book ID: 107513934
• Publisher: Springer US
• Year: 2008
• Tongue: English
• Weight: 887 KB
• Volume: 25
• Category: Article
• ISSN: 0256-1115
• DOI: 10.1007/s11814-008-0100-8