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Influence of impurities on ion beam induced TiSi2 formation

โœ Scribed by C. Dehm; B. Raum; I. Kasko; H. Ryssel


Book ID
113283486
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
311 KB
Volume
80-81
Category
Article
ISSN
0168-583X

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๐Ÿ“œ SIMILAR VOLUMES


Influence of TiSi2 formation temperature
โœ A Sabbadini; F Cazzaniga; T Marangon ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 542 KB

This work is addressed to investigate thermal stability of a thin TiSi film, that is its ability to resist degradation due to 2 heat treatments at high temperatures. The study was carried out as a function of the formation RT treatment (675-7508C) at the end of a common process flow. Sheet resistanc