Influence of Hydrogen Incorporation on the Structure and Stoichiometry of Chemically Vapor Deposited Silica Films

✍ Scribed by Ojeda, F.; Montero, I.; Abel, F.; Albella, J. M.

• Book ID: 121188599
• Publisher: American Chemical Society
• Year: 2001
• Tongue: English
• Weight: 93 KB
• Volume: 13
• Category: Article
• ISSN: 0897-4756
• DOI: 10.1021/cm011040k