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Influence of high channel doping on the inversion layer electron mobility in strained silicon n-MOSFETs

✍ Scribed by Nayfeh, H.M.; Leitz, C.W.; Pitera, A.J.; Fitzgerald, E.A.; Hoyt, J.L.; Antoniadis, D.A.


Book ID
120009298
Publisher
IEEE
Year
2003
Tongue
English
Weight
296 KB
Volume
24
Category
Article
ISSN
0741-3106

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