𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Influence of fluorine on the simulation of the transient enhanced diffusion of 15 keV BF2+ ion implantation into silicon

✍ Scribed by A Dusch; J Marcon; K Masmoudi; K Ketata; F Olivié; M Benhzora; M Ketata


Book ID
114165161
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
225 KB
Volume
186
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES