TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The str
Influence of film thickness and annealing temperature on superconducting Li1+xTi2−xO4 thin films
✍ Scribed by Takashi Inukai; Toshiaki Murakami
- Publisher
- Elsevier Science
- Year
- 1985
- Tongue
- English
- Weight
- 492 KB
- Volume
- 128
- Category
- Article
- ISSN
- 0040-6090
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