Influence of Deposition Temperature, Gas Pressure, Gas Phase Composition, and RF Frequency on Composition and Mechanical Stress of Plasma Silicon Nitride Layers

✍ Scribed by Claassen, W. A. P.

• Book ID: 118009055
• Publisher: The Electrochemical Society
• Year: 1985
• Tongue: English
• Weight: 706 KB
• Volume: 132
• Category: Article
• ISSN: 0013-4651
• DOI: 10.1149/1.2113980