✦ LIBER ✦
The influence of gas-phase etch removal, deposition temperature and substrate properties on the crystallographic perfection of silicon epitaxial layers
✍ Scribed by Dr. F. Richter; Dr. G. Weidner; Dipl.-Kristallphys. A. Borchardt; Dipl.-Phys. E. Bugiel; Dipl.-Phys. M. Kittler; Dr. K. Schmalz; Dr. M. Weidner; Dr. H. Rausch
- Publisher
- John Wiley and Sons
- Year
- 1983
- Tongue
- English
- Weight
- 959 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0232-1300
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