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Influence of deposition on the reactive sputter behaviour during rotating cylindrical magnetron sputtering

✍ Scribed by Li, X Y; Depla, D; Leroy, W P; Haemers, J; De Gryse, R

Book ID: 121448689
Publisher: Institute of Physics
Year: 2008
Tongue: English
Weight: 524 KB
Volume: 41
Category: Article
ISSN: 0022-3727
DOI: 10.1088/0022-3727/41/3/035203

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