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Influence of chlorine implantation on phosphorus diffusivity and oxidation-induced defects in silicon

✍ Scribed by Armigliato, A. ;Solmi, S. ;Donolato, C. ;Negrini, P. ;Gabilli, E. ;Garulli, A. ;Kittler, M.


Publisher
John Wiley and Sons
Year
1985
Tongue
English
Weight
711 KB
Volume
87
Category
Article
ISSN
0031-8965

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