𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Influence of atomic mixing and preferential sputtering on depth profiles and interfaces

✍ Scribed by Liau, Z. L.


Book ID
121226640
Publisher
AVS (American Vacuum Society)
Year
1979
Weight
918 KB
Volume
16
Category
Article
ISSN
0022-5355

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Influence of ion mixing, ion beam-induce
✍ Eun-Hee Cirlin; Yang-Tse Cheng; Philip Ireland; Bruce Clemens πŸ“‚ Article πŸ“… 1990 πŸ› John Wiley and Sons 🌐 English βš– 730 KB

## Abstract To study the factors limiting the depth resolution of sputter depth profiling, we have examined the influence of ion mixing, ion beam‐induced roughness and temperature on the interface resolution of metallic bilayers consisting of Pt on top of Ni or Ti. We studied Pt/Ni and Pt/Ti interf

Sputtering-induced surface roughness of
✍ WΓΆhner, T.; Ecke, G.; Râßler, H.; Hofmann, S. πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 495 KB πŸ‘ 2 views

Sputtering-induced surface roughness is the main source of degradation of the depth resolution observed during depth proÐling of polycrystalline metals. Atomic force microscopy (AFM) images of polycrystalline Al Ðlms at di †erent mean sputtered depths are used to calculate both the depth distributio