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Influence of atomic mixing and preferential sputtering on depth profiles and interfaces

Book ID
104265261
Publisher
Elsevier Science
Year
1980
Tongue
English
Weight
162 KB
Volume
30
Category
Article
ISSN
0042-207X

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✦ Synopsis

Classified abstracts 4523-4531 substrate are minimal. Photoresist images are not degraded, and subsequent lift-off is facilitated., S M Kane and K Y Ahn, J Yuc Sci Tecl~ol, 16 (2). 1979, 171-174.

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