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Influence of annealing temperature on the properties of TiO2films annealed by ex situ and in situ TEM

✍ Scribed by Tangchao Peng 彭堂超, Xiangheng Xiao, Feng Ren, Jinxia Xu, Xiaodong Zhou, Fei Mei, Changzhong Jiang 蒋昌忠


Book ID
118815513
Publisher
Wuhan University of Technology
Year
2012
Tongue
English
Weight
420 KB
Volume
27
Category
Article
ISSN
1000-2413

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Influence of substrate and annealing tem
✍ M.M. Hasan; A.S.M.A. Haseeb; R. Saidur; H.H. Masjuki; M. Hamdi 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 653 KB

TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 °C. The str