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Influence of annealing temperature on microstructural and electrochemical properties of rf-sputtered LiMn2O4film cathodes

โœ Scribed by Jayanth-Babu, K.; Jeevan-Kumar, P.; Hussain, O. M.; Julien, C. M.


Book ID
118790200
Publisher
Springer
Year
2012
Tongue
English
Weight
745 KB
Volume
16
Category
Article
ISSN
1432-8488

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Influence of substrate and annealing tem
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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 ยฐC. The str