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Induced crystallization of amorphous silicon oxide

✍ Scribed by Németh-Sallay, M. ;Barna, Á. ;Lőrinczy, Á. ;Szép, I. C.

Book ID
105372600
Publisher
John Wiley and Sons
Year
1977
Tongue
English
Weight
159 KB
Volume
43
Category
Article
ISSN
0031-8965

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A silicon thin-film technology could lead to less expensive modules by the use of less silicon material and by the implementation of monolithic module processes. A technology based on polycrystalline-silicon thin-films with a grain size between 1 m and 1 mm (pc-Si), seems particularly promising sinc