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Incident angle dependent damage of PMMA during Ar+-ion beam etching

✍ Scribed by Sandra Wolff; Bert Lägel; Stefan Trellenkamp

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Roughness and damage of a GaAs surface a

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bombardment angle dependence of reactive

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The influence of Ar+ and Xe+ ion beam in

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AES depth profiling of TaSi multilayers

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