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In SituStress Measurements During GaN Growth on Ion-Implanted AlN/Si Substrates

โœ Scribed by Jarod C. Gagnon, Mihir Tungare, Xiaojun Weng, Jeffrey M. Leathersich, Fatemeh Shahedipour-Sandvik, Joan M. Redwing


Book ID
113087225
Publisher
Springer US
Year
2011
Tongue
English
Weight
595 KB
Volume
41
Category
Article
ISSN
0361-5235

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Dual-energy Si ion implantation in epita
โœ D. Ozaki; J. Ebihara; Y. Ohshima; R. Takeuchi; T. Inada ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 186 KB

Silicon ions have been implanted in undoped n-type GaN layers epitaxially grown on an AlN/(0001)-Al 2 O 3 substrate. Electrical profiles for n-type GaN layers, formed by dual-energy implantation with 50 and 100 keV Si + ions to a total fluence of 6 โ€ข 10 15 /cm 2 , have been examined by differential