In contrast with PECVD technology, reactive sputtering of graphite allows an independent control of the substrate bias. This characteristic permits the modification of film properties without varying the plasma composition. In the present study, the characteristics of DLC films grown by pulsed-DC re
β¦ LIBER β¦
In-situ TEM tensile testing of DC magnetron sputtered and pulsed laser deposited Ni thin films
β Scribed by R.C. Hugo; H. Kung; J.R. Weertman; R. Mitra; J.A. Knapp; D.M. Follstaedt
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 398 KB
- Volume
- 51
- Category
- Article
- ISSN
- 1359-6454
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