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In situ Raman monitoring of the growth of diamond films in plasma-assisted CVD reactors

โœ Scribed by Mermoux, M.; Fayette, L.; Marcus, B.; Rosman, N.; Abello, L.; Lucazeau, G.


Book ID
122806228
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
552 KB
Volume
4
Category
Article
ISSN
0925-9635

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## ลฝ . A new plasma-enhanced chemical vapor deposition CVD system with an in-situ monitoring system by laser Raman spectroscopy was developed by which it is possible to obtain Raman spectra even when the thickness of a TiO film is only 2 รฅbout 27.5 A. A peak corresponding to titanium silicide was