In-situ monitoring of PE-CVD growth of TiO2 films with laser Raman spectroscopy
โ Scribed by K Nishida; K Morisawa; A Hiraki; S Muraishi; T Katoda
- Book ID
- 104309118
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 561 KB
- Volume
- 159-160
- Category
- Article
- ISSN
- 0169-4332
No coin nor oath required. For personal study only.
โฆ Synopsis
ลฝ
. A new plasma-enhanced chemical vapor deposition CVD system with an in-situ monitoring system by laser Raman spectroscopy was developed by which it is possible to obtain Raman spectra even when the thickness of a TiO film is only 2 รฅbout 27.5 A. A peak corresponding to titanium silicide was observed at the early growth stage of TiO . It was made clear 2 that titanium silicide decomposes with the process of growth and plays a role in the conversion of amorphous titanium dioxide to a crystalline one and enhances the growth of crystal.
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