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In-situ monitoring of PE-CVD growth of TiO2 films with laser Raman spectroscopy

โœ Scribed by K Nishida; K Morisawa; A Hiraki; S Muraishi; T Katoda


Book ID
104309118
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
561 KB
Volume
159-160
Category
Article
ISSN
0169-4332

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โœฆ Synopsis


ลฝ

. A new plasma-enhanced chemical vapor deposition CVD system with an in-situ monitoring system by laser Raman spectroscopy was developed by which it is possible to obtain Raman spectra even when the thickness of a TiO film is only 2 รฅbout 27.5 A. A peak corresponding to titanium silicide was observed at the early growth stage of TiO . It was made clear 2 that titanium silicide decomposes with the process of growth and plays a role in the conversion of amorphous titanium dioxide to a crystalline one and enhances the growth of crystal.


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