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In situ measurements of ultrathin silicon oxide dissolution rates

✍ Scribed by Dinesh Chopra; Ian Ivar Suni

Book ID
108389360
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
102 KB
Volume
323
Category
Article
ISSN
0040-6090

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✍ A MΓΌhe; G MΓΌller πŸ“‚ Article πŸ“… 2000 πŸ› Elsevier Science 🌐 English βš– 614 KB

The dissolution of the silica crucible by the silicon melt acts as a source of oxygen doping in the growth of silicon single crystals by the Czochralski-method. Literature data on the dissolution rate of silica in silicon melts are available up to now only from ex-situ measurements. In the present w