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In situ measurement of mechanical stress in polycrystalline zinc-oxide thin films prepared by magnetron sputtering

โœ Scribed by Hinze, J.; Ellmer, K.

Book ID
120450343
Publisher
American Institute of Physics
Year
2000
Tongue
English
Weight
366 KB
Volume
88
Category
Article
ISSN
0021-8979

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We have prepared in situ thin films of YBa2fu307 by single target dc reactive magnetron sputtering. By a delicate adjustment of the oxygen partial pressure as well as the total sputtering pressure, we can grow stoichiometric films using a stoichiometric target. This method gives highly reproducible