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In situ ellipsometry and infrared analysis of PECVD SiO2 films deposited in an O2/TEOS helicon reactor

✍ Scribed by C. Vallée; A. Goullet; F. Nicolazo; A. Granier; G. Turban

Book ID: 117148374
Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 511 KB
Volume: 216
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(97)00172-5

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