SiOFx and SiO2 deposition in an ECR-HDP reactor: Tool characterisation and film analysis

✍ Scribed by A.J. Kalkman; D.J. den Boer; H. Fukuda; J.B.C. van der Hilst; G.C.A.M. Janssen; S. Radelaar

• Book ID: 114155681
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 321 KB
• Volume: 37-38
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(97)00122-6