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In situ ellipsometric control of Si1−xGexSi heterostructures grown by chemical beam epitaxy

✍ Scribed by P. Boucaud; F. Glowacki; F. Ferrieu; A. Larré; A. Perio; D. Bensahel


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
545 KB
Volume
248
Category
Article
ISSN
0040-6090

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